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Wide Range, Process and Temperature Compensated Voltage Controlled Current Source

机译:宽范围,过程和温度补偿的电压控制电流源

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This paper presents a wide range, voltage controlled-current source circuit that is optimized to compensate for both process and temperature variations. Compensation for process variations is realized by cancellation of the threshold voltage variations. Temperature compensation is applied by the use of a poly resistor. Ninety samples from 3 different chips of the same wafer run were measured, and for the nominal value of 25 nA, current sources have a standard deviation of 1.22% ( ${4.8}times$ improvement over an uncompensated current reference). The simulated standard deviation is 8%, resulting a simulated improvement factor of $8times$ , when samples from different wafer runs are to be measured. Measured temperature drift is 250 ${rm ppm}/^{circ}{rm C}$ for a temperature range of 0–80 $^{circ}{rm C}$. For the mentioned performance, the circuit consists of only 7 components occupying an area of 64 $mu{rm m}times,$91 $mu{rm m}$, using AMS 0.35 $mu{rm m}$, 5 V CMOS process technology. The new current source is used to mimic the behavior of an infrared detector, which creates current in the range of 1–50 nA. A modified version of proposed current source is also designed with no off-chip bias voltages, and has a temperature coefficient of 57 ${rm ppm}/^{circ}{rm C}$ for 9 nA with an acceptable process compensation.
机译:本文介绍了一种范围广泛的压控电流源电路,该电路经过了优化,可以补偿工艺和温度变化。通过抵消阈值电压变化来实现对工艺变化的补偿。通过使用多晶硅电阻器进行温度补偿。测量了来自同一晶片运行的3个不同芯片的90个样品,标称值为25 nA,电流源的标准偏差为1.22%(<公式> $比未补偿的当前参考值提高了{4.8} times $ 。模拟标准偏差为8%,当来自不同晶片运行的样品要达到以下条件时,模拟改进因子 $ 8×$ 被测量。温度范围为0时,测得的温度漂移为250 $ {rm ppm} / ^ {circ} {rm C} $ –80 $ ^ {circ} {rm C} $ 。对于所提到的性能,该电路仅由7个组件组成,占地64个 $ mu {rm m} times,$ 91 $ mu {rm m} $ ,使用AMS 0.35 $ mu {rm m} $ ,5 V CMOS工艺技术。新的电流源用于模仿红外探测器的行为,该探测器产生的电流为1–50 nA。拟议电流源的修改版本也设计为没有片外偏置电压,温度系数为57 <公式公式类型=“ inline”> $ {rm ppm} / ^ {circ } {rm C} $ 为9 nA,并具有可接受的过程补偿。

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