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Robust Ultra-Low Power Non-Volatile Logic-in-Memory Circuits in FD-SOI Technology

机译:FD-SOI技术中的稳健超低功耗非易失性存储器中逻辑电路

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In the upcoming internet of things (IoT) era, spin transfer torque magnetic tunnel junction (STT-MTJ) based non-volatile (NV) memory and circuits for IoT nodes and normally-off electronics will need to meet constraints in speed, energy and robustness. This study focuses on NV logic-in-memory (LIM) architecture. Supply voltage (Vdd) scaling in MTJ based NV-LIM is evaluated on FD-SOI 28 nm node. In order to overcome Vdd scaling bottleneck, an efficient framework for Vdd scaling in NV circuits is proposed with design strategies, e.g., back-bias (BB), poly biasing (PB), and approximate computing. The design vector (Vdd,VBB,PB) generated power-delay curves can provide user-defined LIM circuit aiming for dynamic/leakage power saving, power/speed efficiency and process variation resilient. The design space is explored in near-threshold regime around 0.5 V supply. Simulations of NV-logic, full adder (NV-FA) and flip-flop (NV-FF) are performed, along with insights for circuit design and practical implementation of NV-LIM circuits with FD-SOI technology.
机译:在即将到来的物联网(IoT)时代,用于物联网节点和常关电子设备的基于自旋传递转矩磁隧道结(STT-MTJ)的非易失性(NV)存储器和电路将需要满足速度,能量和健壮性。这项研究的重点是NV内存中逻辑(LIM)架构。在FD-SOI 28 nm节点上评估基于MTJ的NV-LIM中的电源电压(Vdd)定标。为了克服Vdd缩放瓶颈,提出了一种具有NVN电路中Vdd缩放的有效框架,该框架具有设计策略,例如反向偏置(BB),多偏置(PB)和近似计算。设计矢量(Vdd,VBB,PB)生成的功率延迟曲线可以提供用户定义的LIM电路,旨在实现动态/泄漏功率节省,功率/速度效率和过程变化弹性。在0.5 V电源附近的阈值范围内探索设计空间。进行了NV逻辑,全加法器(NV-FA)和触发器(NV-FF)的仿真,以及对采用FD-SOI技术的NV-LIM电路的电路设计和实际实现的见解。

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