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首页> 外文期刊>IEEE Photonics Technology Letters >Doping level and type of GaInP saturable absorbing layers for realizing pulsating 650-nm-band AlGaInP laser diodes
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Doping level and type of GaInP saturable absorbing layers for realizing pulsating 650-nm-band AlGaInP laser diodes

机译:用于实现脉动650 nm波段AlGaInP激光二极管的GaInP饱和吸收层的掺杂水平和类型

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摘要

On AlGaInP laser diodes, the doping level and type of GaInP saturable absorbing (SA) layers suitable for self sustained pulsation are clarified. Optical properties of n- and p-type GaInP quantum wells (QWs) have been evaluated by means of time-resolved photoluminescence (TRPL) spectroscopy. As the doping level becomes higher, the recombination lifetime becomes shorter, and it can be reduced to 1.1 ns at our highest doping level (1=2/spl times/10/sup 18/ cm/sup -3/). For highly doped n-type QW, a PL peak energy shift as large as 26 meV is observed by high-density excitation. Highly doped p-type SA layer is suitable for self-sustained pulsating laser diodes, because it offers short recombination lifetime and no Burstein shift under highly excited condition.
机译:在AlGaInP激光二极管上,阐明了适合自持续脉动的GaInP饱和吸收(SA)层的掺杂水平和类型。 n型和p型GaInP量子阱(QW)的光学特性已通过时间分辨光致发光(TRPL)光谱进行了评估。随着掺杂水平的提高,复合寿命缩短,并且在我们的最高掺杂水平(1 = 2 / spl乘以10 / sup 18 / cm / sup -3 /)下,复合寿命可以缩短至1.1 ns。对于高掺杂n型QW,通过高密度激发观察到PL峰值能量位移高达26 meV。高掺杂的p型SA层适用于自持脉动激光二极管,因为它的复合寿命短,并且在高激发条件下没有Burstein位移。

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