首页> 外国专利> Analog silicon-on-insulator semiconductor circuit arrangement, has diode doped region formed in active semiconductor region of specific conductive type up to surface of insulating layer, and measuring diode realized over diode side

Analog silicon-on-insulator semiconductor circuit arrangement, has diode doped region formed in active semiconductor region of specific conductive type up to surface of insulating layer, and measuring diode realized over diode side

机译:模拟绝缘体上硅半导体电路装置,具有在特定导电类型的有源半导体区域中形成至绝缘层表面的二极管掺杂区,以及在二极管侧实现的测量二极管

摘要

The arrangement has an insulating layer (2) formed on a semiconductor substrate (1). An active semiconductor region (AA) is formed on the insulating layer. Source and drain regions of a multi-gate FET are formed in the active region. A diode doped region is formed in the active semiconductor region of a specific conductive type up to a surface of the insulating layer. A measuring diode is realized over a diode side with the source and drain regions and is bordered at a side by another insulating layer (4). An independent claim is also included for a method for temperature determination in a semiconductor circuit arrangement.
机译:该装置具有形成在半导体衬底(1)上的绝缘层(2)。有源半导体区域(AA)形成在绝缘层上。多栅极FET的源极和漏极区域形成在有源区域中。在特定导电类型的有源半导体区域中直至绝缘层的表面形成二极管掺杂区域。测量二极管在带有源极和漏极区域的二极管侧面上实现,并在侧面与另一个绝缘层(4)相连。还包括针对半导体电路装置中的温度确定方法的独立权利要求。

著录项

  • 公开/公告号DE102006013721A1

    专利类型

  • 公开/公告日2007-09-27

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20061013721

  • 申请日2006-03-24

  • 分类号H01L23/58;H01L21/66;H01L27/06;H01L23/544;G01K7/01;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:21

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