首页> 外文期刊>IEEE Journal of Quantum Electronics >Lateral npn junction and semi-insulating GaAs current confinement structure for index-guided InGaAs/AlGaAs lasers by molecular beam epitaxy
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Lateral npn junction and semi-insulating GaAs current confinement structure for index-guided InGaAs/AlGaAs lasers by molecular beam epitaxy

机译:分子束外延用于折射率导引的InGaAs / AlGaAs激光器的横向npn结和半绝缘GaAs电流限制结构

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摘要

A current confinement structure with a lateral npn junction and a semi-insulating (SI) GaAs is examined for an index-guided InGaAs/AlGaAs strained quantum-well laser. Amphoteric doping of Si in GaAs and AlGaAs is used to form a lateral npn structure grown over a channeled patterned low-temperature-grown SI GaAs layer. A threshold current of 7.4 mA and total external differential quantum efficiency of 59% under room-temperature continuous-wave (CW) operation are achieved with devices fabricated by a self-aligned process. A device with antireflection-high-reflection (AR-HR) coating had a light output over 300 mW.
机译:对于折射率导向的InGaAs / AlGaAs应变量子阱激光器,研究了具有横向npn结和半绝缘(SI)GaAs的电流限制结构。 GaAs和AlGaAs中Si的两性掺杂被用来形成横向npn结构,该结构在沟道图形化的低温生长的Si GaAs层上生长。利用自对准工艺制造的器件在室温连续波(CW)操作下可实现7.4 mA的阈值电流和59%的总外部差分量子效率。具有防反射-高反射(AR-HR)涂层的设备的光输出超过300 mW。

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