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Comparison between planar InP/InGaAs/InP pin photodiodes with symmetrical and asymmetrical doping profiles

机译:具有对称和不对称掺杂轮廓的平面InP / InGaAs / InP引脚光电二极管的比较

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摘要

High-speed p-end-illuminated planar InP/InGaAs/InP heterojunction p-i-n photodiodes have been fabricated with symmetrical and asymmetrical doping profiles. Static and dynamic characteristics of both devices were measured for comparison. The device with symmetrical doping profile exhibits inferior characteristics at low reverse bias (< 4V). Nevertheless, if sufficiently reverse biased (≥4V), a symmetrically doped device can have DC responsivity comparable to, and maximum 3 dB bandwidth higher than, a conventional asymmetrically doped device. The inferior characteristics at low reverse bias and promoted maximum bandwidth of a symmetrically doped device can be, respectively attributed to the heterointerface exposed in the depletion region and reduced device capacitance caused by an extra-depleted InP region.
机译:高速p端照明的平面InP / InGaAs / InP异质结p-i-n光电二极管已制成具有对称和不对称的掺杂轮廓。测量了两种设备的静态和动态特性以进行比较。具有对称掺杂分布的器件在低反向偏置(<4V)下表现出较差的特性。但是,如果充分地反向偏置(≥4V),则对称掺杂的设备可以具有与常规不对称掺杂的设备相当的DC响应度,并且最大带宽比传统的非对称掺杂的设备高3 dB。对称掺杂的器件在低反向偏置下的劣质特性和提升的最大带宽可分别归因于在耗尽区暴露的异质界面和由耗尽InP区引起的器件电容减小。

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