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First-principles cluster study of electronic structures, locations and hyperfine interactions of isolated atoms and ions in silicon

机译:硅中孤立原子和离子的电子结构,位置和超精细相互作用的第一原理聚类研究

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The electronic structures of the dilute transition metal (TM) impurities, V2 + , Cr + , Mn2 + , and Mn0 in silicon have been studied using the Hartree–Fock (HF) procedure combined with many-body perturbation theory (MBPT). The systems studied involved the TM impurities at the hexagonal interstitial (H i ), tetrahedral interstitial (T i ) and substitutional (S) locations. Investigations of the binding energy and local potential energy surface of the TM impurity-Si systems indicate that the TM impurities are binding at the T i location. Hyperfine interaction constants (A) of the TM impurities at the T i and S sites are presented and compared with available experimental results (Woodbury and Ludwig, J Phys Rev 117:102, 1960a, Phys Rev Lett 5:98, b) from Electron Paramagnetic Resonance (EPR) measurements.
机译:稀过渡金属(TM)杂质V 2 + ,Cr + ,Mn 2 + 和Mn 的电子结构利用Hartree-Fock(HF)程序结合多体摄动理论(MBPT)对硅中的0 进行了研究。研究的系统涉及六边形间隙(H i ),四面体间隙(T i )和替代(S)位置的TM杂质。对TM杂质-Si系统的结合能和局部势能表面的研究表明,TM杂质在T i 位置处结合。给出了T i 和S位置的TM杂质的超精细相互作用常数(A)并与可用的实验结果进行了比较(Woodbury和Ludwig,J Phys Rev 117:102,1960a,Phys Rev Lett 5 :98,b)来自电子顺磁共振(EPR)测量。

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