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Enhanced chemical vapor deposition of diamond by wavelength-matched vibrational excitations of ethylene molecules using tunable CO_2 laser irradiation

机译:通过可调谐CO_2激光辐射,通过乙烯分子的波长匹配振动激发来增强金刚石的化学气相沉积

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摘要

Wavelength-matched vibrational excitations of ethylene (C_2H_4) molecules using a tunable carbon dioxide (CO_2) laser were employed to significantly enhance the chemical vapor deposition (CVD) of diamond in open air using a precursor gas mixture of C_2H_4, acetylene (C_2H_2), and oxygen (O2). The CH_2-wag vibration mode (v_7) of the C_2H_4 molecules was selected to achieve the resonant excitation in the CVD process. Both laser wavelengths of 10.591 and 10.532 μm were applied to the CVD processes to compare the C_2H_4 excitations and diamond depositions. Compared with 10.591 μm produced by common CO_2 lasers, the laser wavelength of 10.532 μm is much more effective to excite the C_2H_4 molecules through the CH_2-wag mode. Under the laser irradiation with a power of 800 W and a wavelength of 10.532 μm, the grain size in the deposited diamond films was increased by 400% and the film thickness was increased by 300%. The quality of the diamond crystals was also significantly enhanced.
机译:使用可调谐二氧化碳(CO_2)激光与乙烯(C_2H_4)分子进行波长匹配的振动激发,使用C_2H_4,乙炔(C_2H_2),和氧气(O2)。选择C_2H_4分子的CH_2-wag振动模式(v_7)以在CVD过程中实现共振激发。分别将10.591和10.532μm的激光波长应用于CVD工艺,以比较C_2H_4激发和金刚石沉积。与普通CO_2激光器产生的10.591μm相比,波长为10.532μm的激光更有效地通过CH_2摆动模式激发C_2H_4分子。在功率为800W,波长为10.532μm的激光照射下,沉积的金刚石膜的晶粒尺寸增加了400%,膜厚度增加了300%。金刚石晶体的质量也显着提高。

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  • 来源
    《Extremes》 |2009年第6期|1103-1108|共6页
  • 作者单位

    Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

    Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;

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