首页> 美国政府科技报告 >Microwave Plasma Enhanced Chemical Vapor Deposition of Diamond in Vapor of Methanol-Based Liquid Solutions
【24h】

Microwave Plasma Enhanced Chemical Vapor Deposition of Diamond in Vapor of Methanol-Based Liquid Solutions

机译:微波等离子体增强化学气相沉积金刚石在甲醇基液体溶液中的蒸汽

获取原文

摘要

A method for depositing diamond crystals and diamond films from methanol-based liquid solutions is reported. Liquid solutions are prepared by mixing methanol with other carbon containing liquid compounds which contain a greater than one ratio of carbon to oxygen such as acetone, ethanol, and iso- propanol. An electrical discharge is generated by microwave power in a metal cavity in order to dissociate the vapor mixture from one of the liquid solutions, from which radicals such as OH, O, and H that etch non-diamond carbon much faster than diamond, as well as carbon containing radicals such as CH3 are produced on and near a substrate surface. Graphitic, amorphous and other forms of non-diamond carbon deposits are either suppressed from being deposited on the substrate or preferentially etched by OH, O, and H radicals resulting in the deposition of high quality diamond crystals and diamond films without the need for compressed gases such as hydrogen and methane.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号