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Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions
Method of plasma enhanced chemical vapor deposition of diamond using methanol-based solutions
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机译:使用甲醇基溶液的金刚石的等离子体增强化学气相沉积方法
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摘要
Briefly described, methods of forming diamond are described. A representative method, among others, includes: providing a substrate in a reaction chamber in a non-magnetic-field microwave plasma system; introducing, in the absence of a gas stream, a liquid precursor substantially free of water and containing methanol and at least one carbon and oxygen containing compound having a carbon to oxygen ratio greater than one, into an inlet of the reaction chamber; vaporizing the liquid precursor; and subjecting the vaporized precursor, in the absence of a carrier gas and in the absence in a reactive gas, to a plasma under conditions effective to disassociate the vaporized precursor and promote diamond growth on the substrate in a pressure range from about 70 to 130 Torr.
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