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Gate Level NBTI and Leakage Co-Optimization in Combinational Circuits with Input Vector Cycling

机译:使用输入向量循环的组合电路中的Gate Leve NBTI和泄漏协同优化

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Negative Bias Temperature Instability (NBTI) effect occurs in a PMOS transistor when turned ON leading to threshold voltage degradation. As sub-threshold leakage is significant in nanoscale CMOS circuits, input vector control can be employed wherein a Minimum Leakage Vector (MLV) is applied to the circuit during idle periods. In such a case, the ON PMOS transistors on the critical path are subject to NBTI stress for prolonged periods. Transistors can recover from stress when turned OFF. Based on this observation, we propose a vector cycling based leakage/NBTI co-optimization: a pair of MLVs are identified such that when applied alternately, on the critical path, PMOS transistors activated by one vector are turned OFF by the other vector. We employ Simulated Annealing (SA) for stochastic search of the first vector followed by back tracking to identify the second vector. Experimental results for a subset of ISCAS85 benchmarks implemented in 45 nm technology demonstrate the feasibility of vector cycling approach. When compared to leakage-only optimization, NBTI-only optimization, and co-optimization, on average, vector cycling yields 11, 3, and 6 percent NBTI improvements with 18, -9, and 4 percent leakage overheads respectively. The average area and dynamic power overheads are 13.78 and 0.15 percent respectively.
机译:在接通导通阈值电压劣化时,在PMOS晶体管中发生负偏置温度不稳定性(NBTI)效应。由于纳米级CMOS电路中的子阈值泄漏很大,可以采用输入载体控制,其中在空闲时段期间将最小泄漏矢量(MLV)施加到电路。在这种情况下,关键路径上的PMOS晶体管延长了临界路径上的NBTI应力。晶体管可以在关闭时从应力恢复。基于该观察,我们提出了一种基于循环的泄漏/ NBTI共同优化:识别一对MLV,使得当交替施加时,在临界路径上,由另一个向量关闭由一个矢量激活的PMOS晶体管。我们采用模拟退火(SA)用于对第一向量的随机搜索,然后回到后面跟踪以识别第二个向量。 45 nm技术实施的ISCAS85基准子集的实验结果表明了载体循环方法的可行性。与仅泄漏的优化相比,仅常用NBTI的优化和共同优化,平均循环产率11,3和6%的NBTI改善,分别具有18,-9和4%的泄漏开销。平均面积和动态功率开销分别为13.78和0.15%。

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