Surface-emitting laser diode with distributed Bragg reflector and buried heterostructure

摘要

A surface-emitting laser diode (SELD) with distributed Bragg reflector (DBR) and buried heterostructure (BH) is fabricated by the metalorganic chemical vapour deposition (MOCVD), reactive ion beam etching (RIBE) and liquid phase epitaxial (LPE) regrowth techniques. An Al/sub 0.1/Ga/sub 0.9/As/Al/sub 0.7/Ga/sub 0.3/As multilayer is employed for the lower reflector. The active region is embedded with Al/sub 0.4/Ga/sub 0.6/As current blocking layers. The threshold current is 28 mA, and the spectral width is 2.5 AA. A 2*2 array is also demonstrated.