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Monolithically integrated III-Sb CW super-luminal light emitting diodes on non-miscut Si (100) substrates

机译:在未错误切割的Si(100)衬底上的单片集成III-Sb CW超发光二极管

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摘要

Reported is super-luminescent emission under room-temperature, continuous-wave conditions from GaSb quantum-well-based light emitting diodes (LED), monolithically integrated on Si (100) substrates. The LEDs are realised with substrate growth temperature under 500degC for the entire process and the Si (001) substrate is non-miscut. The lattice mismatch at the AlSb/Si interface is accommodated by interfacial misfit dislocation arrays (IMF) resulting in low defect-density III-Sb material without thick metamorphic buffers. The devices are grown in etched trenches on the Si substrate to reduce anti-phase domains in the III-Sb. The n-Si substrate is contacted directly and thus current flows through the III-Sb/Si IMF interface. The diodes have extremely low leakage current density (Jleakage<0.2 A/cm2) in the reverse bias (-10 V) and show very good diode characteristics but exhibit a slightly elevated forward resistance (R~ 27 Omega), likely to be because of the IMF. The super-luminal spectra peaks at 2.14 mum with maximum output power ~0.125 mW
机译:报告了在室温,连续波条件下,单片集成在Si(100)衬底上的基于GaSb量子阱的发光二极管(LED)的超发光发射。在整个过程中,LED的衬底生长温度均低于500°C,而Si(001)衬底是无误切的。 AlSb / Si界面处的晶格失配由界面失配位错阵列(IMF)来解决,导致缺陷密度低的III-Sb材料没有较厚的变质缓冲层。器件生长在Si衬底上的蚀刻沟槽中,以减少III-Sb中的反相畴。 n-Si基板直接接触,因此电流流过III-Sb / Si IMF界面。二极管在反向偏置(-10 V)中具有极低的泄漏电流密度(漏电<0.2 A / cm2),显示出非常好的二极管特性,但正向电阻略高(R〜27 Omega),这可能是由于IMF。超发光光谱的峰值在2.14 mum处达到最大输出功率〜0.125 mW

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