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Current gain-Early voltage products in graded-base Si/Si/sub 1-x/Ge/sub x//Si heterojunction bipolar transistors

机译:梯度基极Si / Si / sub 1-x / Ge / sub x // Si异质结双极晶体管中的电流增益-早期电压乘积

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Summary form only given. An examination is made of the current-gain-Early-voltage ( beta -V/sub A/) tradeoff for graded base Si/Si/sub 1-x/Ge/sub x//Si heterojunction bipolar transistors (HBTs). A two-layer stepped-based structure was used to achieve a beta V/sub A/ product greater than 100000 V at room temperature for a device predicted to have a cutoff frequency in excess of 10 GHz. This is an improvement of this figure of merit by a factor greater than 20. It is shown that the Early voltage in a bipolar transistor can be improved dramatically by inserting a thin heavily doped p/sup +/-SiGe layer at the collector side of the base, without any reduction in gain.
机译:仅提供摘要表格。研究了渐变基极Si / Si / sub 1-x / Ge / sub x // Si异质结双极晶体管(HBT)的电流增益-早期电压(beta -V / sub A /)的取舍。使用两层基于阶梯的结构,可在室温下使截断频率超过10 GHz的设备获得大于100000 V的beta V / sub A /乘积。这是该品质因数的改善,幅度提高了20倍以上。结果表明,通过在PNP的集电极侧插入一个薄的重掺杂p / sup +/- SiGe层,可以极大地改善双极晶体管的早期电压。基础,而不会减少任何收益。

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