首页> 外文期刊>IEEE Transactions on Electron Devices >Characteristics of 0.8- and 0.2- mu m gate length In/sub x/Ga/sub 1-x/As/In/sub 0.52/Al/sub 0.48/As/InP (0.53>or=x>or=0.70) modulation-doped field-effect transistors at cryogenic temperatures
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Characteristics of 0.8- and 0.2- mu m gate length In/sub x/Ga/sub 1-x/As/In/sub 0.52/Al/sub 0.48/As/InP (0.53>or=x>or=0.70) modulation-doped field-effect transistors at cryogenic temperatures

机译:栅极长度为0.8 / 0.2μm的特性In / sub x / Ga / sub 1-x / As / In / sub 0.52 / Al / sub 0.48 / As / InP(0.53> or = x> or = 0.70)调制低温下掺杂的场效应晶体管

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摘要

The performance characteristics of InP-based pseudomorphic MODFETs with varying the In composition (0.53>or=x>or=0.70), which changes the strain in the channel, were studied. The temperature was varied in the range of 40-300 K, and the devices had gate lengths L/sub g/ of 0.8 and 0.2 mu m. The analysis predicts an increase in the intrinsic cutoff frequency with increasing In composition and decreasing temperature and gate length. Also, the analysis predicts that the increase in cutoff frequency with decreasing temperature is less significant with increasing In composition and decreasing gate length. Preliminary experimental results show that as In composition increases from 0.53 to 0.70, f/sub T/ increases by 30-40%, and as the temperature decreases from 300 to 40 K, f/sub T/ improves by 15-30%, both for 0.8- and 0.2- mu m devices.
机译:研究了随着In组成(0.53>或= x>或= 0.70)的变化而改变沟道中应变的基于InP的伪变形MODFET的性能特征。温度在40-300K的范围内变化,并且器件的栅极长度L / sub g /为0.8和0.2μm。分析预测,随着In成分的增加以及温度和栅极长度的减小,本征截止频率也会增加。同样,分析预测,随着In含量的增加和栅极长度的减小,截止频率随温度降低的增加不那么显着。初步实验结果表明,随着In组成从0.53增加到0.70,f / sub T /增加30-40%,并且随着温度从300 K降低到40 K,f / sub T /改善15-30%,两者适用于0.8和0.2微米的设备。

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