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Effects of collector doping on DC and RF performance of AlInAs/GaInAs/InP double heterojunction bipolar transistors

机译:集电极掺杂对AlInAs / GaInAs / InP双异质结双极晶体管的DC和RF性能的影响

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摘要

Summary form only given. AlInAs/GaInAs/InP double heterojunction bipolar transistors (DHBTs) with three different InP collector dopings of 1.4*10/sup 16/, 2.4*10/sup 16/, and 3*10/sup 16/ cm/sup -3/ and a collector thickness of 0.75 mu m have been made for microwave power applications. The DC and RF performance of the devices was found to be strongly dependent on the collector doping. This strong sensitivity to the collector doping is due to the conduction band discontinuity between GaInAs and InP at the base-collector junction. DC and RF characterization was performed on 2- mu m*20- mu m single-emitter geometry devices which are used in the construction of the microwave power cells. The DHBTs achieved base-collector breakdown voltages in excess of 20 V and common-emitter breakdown voltages of more than 14 V (both measured at 100 mu A of current). The f/sub T/ and f/sub max/ of the devices were in the range of 65 to 75 GHz. DC current gains were in the range of 50 to 70. The devices with the collector doping of 3*10/sup 16/ cm/sup -3/ could be operated up to 10/sup 5/ A/cm/sup 2/ collector current density without gain compression.
机译:仅提供摘要表格。具有三个不同InP集电极掺杂的AlInAs / GaInAs / InP双异质结双极晶体管(DHBT),分别为1.4 * 10 / sup 16 /,2.4 * 10 / sup 16 /和3 * 10 / sup 16 / cm / sup -3 /用于微波功率的收集器厚度为0.75微米。发现器件的DC和RF性能在很大程度上取决于集电极掺杂。对集电极掺杂的强烈敏感性是由于在基极-集电极结处GaInAs和InP之间的导带不连续。 DC和RF表征是在2微米×20微米单发射极几何器件上进行的,该器件用于构造微波功率电池。 DHBT实现的基极-集电极击穿电压超过20 V,共射极击穿电压超过14 V(均在100μA电流下测量)。器件的f / sub T /和f / sub max /在65至75 GHz的范围内。直流电流增益在50到70范围内。集电极掺杂为3 * 10 / sup 16 / cm / sup -3 /的器件最高可运行10 / sup 5 / A / cm / sup 2 /集电极没有增益压缩的电流密度。

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