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首页> 外文期刊>IEEE Transactions on Electron Devices >Two-dimensional simulations of drain-current transients in GaAs MESFET's with semi-insulating substrates compensated by deep levels
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Two-dimensional simulations of drain-current transients in GaAs MESFET's with semi-insulating substrates compensated by deep levels

机译:半绝缘衬底的GaAs MESFET的漏极电流瞬变的二维模拟,并通过深能级进行了补偿

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摘要

Drain-current transients of GaAs MESFET's with deep donors "EL2" in the semi-insulating substrate are simulated in the range t=10/sup -13/ to 10/sup 2/ s. It is shown that in the drain step responses, there exists a "quasi-steady state" where the deep donors do not respond to the voltage change and the drain currents become constant temporarily. The drain currents begin to decrease or increase gradually when the deep donors begin to capture or emit electrons, reaching real steady-state values. I-V curves are quite different between the "quasi-steady state" and the steady state. Therefore, the deep donors in the semi-insulating substrate can be causes of drain-current drifts and hysteresis in I-V curves. Effects of introducing a p-buffer layer are also studied. It is concluded that the use of a low acceptor density semi-insulating substrate combined with introducing a p-buffer layer is effective to minimize the unfavorable phenomena and to utilize high performances of GaAs MESFET's.
机译:在t = 10 / sup -13 /到10 / sup 2 / s的范围内,模拟了半绝缘衬底中具有深施主“ EL2”的GaAs MESFET的漏极电流瞬态。结果表明,在漏极阶跃响应中,存在一个“准稳态”,其中深的施主不响应电压变化,漏极电流暂时保持恒定。当深的​​施主开始捕获或发射电子时,漏极电流开始逐渐减小或增大,从而达到实际的稳态值。 I-V曲线在“准稳态”和稳态之间有很大的不同。因此,半绝缘基板中的深施主可能是漏极电流漂移和IV曲线中的磁滞的原因。还研究了引入p缓冲层的效果。结论是,结合使用低受体密度的半绝缘衬底和引入p缓冲层可有效地减少不利现象并利用GaAs MESFET的高性能。

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