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SEMI-INSULATING GaAs SUBSTRATE AND METHOD FOR PRODUCING GaAs SUBSTRATE

机译:半绝缘GaAs基质及生产GaAs基质的方法

摘要

A semi-insulating GaAs substrate exhibiting a principal surface orientation which is the (100) plane and having a disc shape which exhibits a diameter of at least 150mm, wherein the difference between measured values of dislocation density measured at a first measurement point, a second measurement point and a third measurement point is within 2,000cm-2, when the first measurement point is the center of the principal surface, the second measurement point is the center of a first line segment extending from the first measurement point in the [010] direction to the outer-circumference of the semi-insulating GaAs substrate, and the third measurement point is a point located 10mm to the inside from the outer-circumference along the first line segment.
机译:一种半绝缘GaAs基板,其主表面取向为(100)平面,并且其圆盘形状的直径至少为150mm,其中,在第一测量点,第二测量点和第二测量点测量的位错密度的测量值之差测量点和第三测量点在2,000cm -2 内,当第一测量点是主表面的中心时,第二测量点是从第一测量点延伸的第一线段的中心相对于半绝缘GaAs基板的外周,在[010]方向上的测量点,并且第三测量点是沿第一线段从外周到内部10mm的点。

著录项

  • 公开/公告号WO2020121526A1

    专利类型

  • 公开/公告日2020-06-18

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC INDUSTRIES LTD.;

    申请/专利号WO2018JP46154

  • 发明设计人 ISHIKAWA YUKIO;HAGI YOSHIAKI;

    申请日2018-12-14

  • 分类号C30B29/42;C30B11;

  • 国家 WO

  • 入库时间 2022-08-21 11:10:42

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