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首页> 外文期刊>IEEE Transactions on Electron Devices >High-gain, low offset voltage, and zero potential spike by InGaP/GaAs /spl delta/-doped single heterojunction bipolar transistor (/spl delta/-SHBT)
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High-gain, low offset voltage, and zero potential spike by InGaP/GaAs /spl delta/-doped single heterojunction bipolar transistor (/spl delta/-SHBT)

机译:InGaP / GaAs / spl delta /掺杂单异质结双极晶体管(/ spl delta / -SHBT)的高增益,低失调电压和零电位尖峰

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摘要

We report on fabrication, characterization, and comparison of InGaP/GaAs single heterojunction bipolar transistors (SHBT's) and heterostructure-emitter bipolar transistors (HEBT's). The SHBT with a /spl delta/-doped sheet located at the E-B heterointerface (/spl delta/-SHBT) exhibits a common-emitter current gain as high as 410 and an extremely low offset voltage of 55 mV. Even though at the small collector current density of 1/spl times/10/sup -3/ A/cm/sup 2/, the current gain is still larger than 20. Theoretical derivations show that the zero potential spike exists near the E-B junction under +1.5 V forward bias. However, an HEBT with a 700-/spl Aring/ narrow energy-gap emitter shows a small current gain and a collector current density due to the charge storage and bulk recombination effect. On the other hand, the increase of the CB capacitance in our /spl delta/-SHBT is very small as compared with conventional HBT's.
机译:我们报告了InGaP / GaAs单异质结双极晶体管(SHBT)和异质结构发射极双极晶体管(HEBT)的制造,表征和比较。位于E-B异质界面(/ spl delta / -SHBT)处具有/ spl delta /掺杂片的SHBT表现出高达410的共发射极电流增益和55 mV的极低失调电压。即使在小集电极电流密度为1 / spl乘以/ 10 / sup -3 / A / cm / sup 2 /时,电流增益仍大于20。理论推导表明,零电位尖峰存在于EB结附近在+1.5 V正向偏置下。然而,由于电荷存储和体复合效应,具有700- / spl Aring /窄能隙发射极的HEBT显示出较小的电流增益和集电极电流密度。另一方面,与传统的HBT相比,/ spl delta / -SHBT中CB电容的增加非常小。

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