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首页> 外文期刊>Electronics Letters >In/sub 0.53/Al/sub 0.22/Ga/sub 0.25/As/InP heterojunction bipolar transistor with /spl delta/-doped continuous-conduction-band (CCB) structure
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In/sub 0.53/Al/sub 0.22/Ga/sub 0.25/As/InP heterojunction bipolar transistor with /spl delta/-doped continuous-conduction-band (CCB) structure

机译:具有/ spl delta /掺杂的连续导带(CCB)结构的In / sub 0.53 / Al / sub 0.22 / Ga / sub 0.25 / As / InP异质结双极晶体管

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摘要

A new In/sub 0.53/Al/sub 0.22/Ga/sub 0.25/As/InP heterojunction bipolar transistor with a /spl delta/-doped continuous-conduction-band (CCB) structure has been fabricated successfully and studied. The use of the /spl delta/-doped CCB structure can effectively eliminate the potential spike in the E-B heterojunction. An offset voltage as low as 50 mV and a relatively high current gain of 80 have been obtained experimentally. The studied device is therefore promising for practical circuit applications.
机译:已经成功地制造并研究了一种新的In / sub 0.53 / Al / sub 0.22 / Ga / sub 0.25 / As / InP异质结双极晶体管,具有/ spl delta /掺杂的连续导带(CCB)结构。 / spl delta /掺杂的CCB结构的使用可以有效消除E-B异质结中的潜在尖峰。通过实验已经获得了低至50 mV的失调电压和相对较高的80的电流增益。因此,所研究的器件在实际电路应用中很有希望。

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