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A physical and scalable I-V model in BSIM3v3 for analog/digital circuit simulation

机译:BSIM3v3中的物理和可扩展I-V模型,用于模拟/数字电路仿真

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摘要

A new physical and continuous BSIM (Berkeley Short-Channel IGFET Model) I-V model in BSIM3v3 is presented for circuit simulation. Including the major physical effects in state-of-the art MOS devices, the model describes current characteristics from subthreshold to strong inversion as well as from the linear to the saturation operating regions with a single I-V expression, and guarantees the continuities of I/sub ds/, conductances and their derivatives throughout all V/sub gs/, V/sub ds/, and T/sub bs/, bias conditions. Compared with the previous BSIM models, the improved model continuity enhances the convergence property of the circuit simulators. Furthermore, the model accuracy has also been enhanced by including the dependencies of geometry and bias of parasitic series resistances, narrow width, bulk charge, and DIBL effects. The new model has the extensive built-in dependencies of important dimensional and processing parameters (e.g., channel length, width, gate oxide thickness, junction depth, substrate doping concentration, etc.). It allows users to accurately describe the MOSFET characteristics over a wide range of channel lengths and widths for various technologies, and is attractive for statistical modeling. The model has been implemented in the circuit simulators such as Spectre, Hspice, SmartSpice, Spice3e2, and so on.
机译:提出了一种新的物理和连续BSIM3v3中的BSIM(伯克利短通道IGFET模型)I-V模型,用于电路仿真。该模型包括最先进的MOS器件的主要物理影响,该模型使用单个IV表达式描述了从亚阈值到强反演以及从线性到饱和工作区域的当前特性,并保证了I / sub的连续性ds /,在所有V / sub gs /,V / sub ds /和T / sub bs /的偏置条件下的电导及其导数。与以前的BSIM模型相比,改进的模型连续性增强了电路模拟器的收敛性。此外,通过包括几何形状和寄生串联电阻的偏置,窄宽度,体电荷和DIBL效应的依赖性,还提高了模型的准确性。新模型具有对重要尺寸和工艺参数(例如沟道长度,宽度,栅极氧化物厚度,结深度,衬底掺杂浓度等)的广泛内置依赖性。它使用户能够针对各种技术在宽范围的通道长度和宽度上准确描述MOSFET的特性,并且对于统计建模具有吸引力。该模型已在Spectre,Hspice,SmartSpice,Spice3e2等电路模拟器中实现。

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