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A novel crosstalk isolation structure for bulk CMOS power IC's

机译:用于大容量CMOS功率IC的新型串扰隔离结构

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This paper reports a simple and effective crosstalk isolation structure for use in bulk CMOS power integrated circuits (PIC's). Excellent crosstalk isolation characteristics were obtained by incorporating this novel crosstalk isolation structure into a CMOS/LDMOS/LIGBT high-voltage technology. The structure consists of an isolator and a collector, and is placed in the epitaxial layer between the power device and the CMOS structure. Two-dimensional (2-D) simulations were used to study the effects of the isolation structure on the carrier flow and latching mechanism in the power device/CMOS composite structure. Experimental results show that, when using the isolation structure, operating current of the body diode of the LDMOST can be improved by 16 times and operating current of the LIGBT ran be improved by five times before CMOS latchup in the control circuit occurs. The structure is also applicable for isolation between integrated conductivity modulated power devices. Over eight times reduction in current surge in the adjacent LIGBT during turn-off transient of the main LIGBT is observed.
机译:本文报告了一种简单有效的串扰隔离结构,该结构可用于批量CMOS电源集成电路(PIC)。通过将这种新颖的串扰隔离结构结合到CMOS / LDMOS / LIGBT高压技术中,可以获得出色的串扰隔离特性。该结构由隔离器和集电极组成,并放置在功率器件和CMOS结构之间的外延层中。二维(2-D)仿真用于研究隔离结构对功率器件/ CMOS复合结构中载流子和锁存机制的影响。实验结果表明,在采用隔离结构的情况下,在控制电路中发生CMOS闩锁之前,LDMOST体二极管的工作电流可以提高16倍,LIGBT的工作电流可以提高5倍。该结构也可用于集成电导率调制功率器件之间的隔离。观察到在主LIGBT的关断瞬态期间,相邻LIGBT中的电流浪涌降低了八倍以上。

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