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Impact of Downscaling and Poly-Gate Depletion on the RF Noise Parameters of Advanced nMOS Transistors

机译:缩小尺寸和多栅极耗尽对高级nMOS晶体管的RF噪声参数的影响

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摘要

For the first time, the effects of poly depletion on the RF noise performance of advanced CMOS transistors are reported and analyzed. Based on measurements and physical device simulations we quantify the increasing danger of poly gate depletion with downscaling on the RF noise parameters of CMOS devices. While poly depletion does not affect the minimum noise figure, it results in a degradation of the noise matching freedom for RFIC designers. This trend worsens with technology downscaling.
机译:首次报道并分析了多晶硅耗尽对先进CMOS晶体管的RF噪声性能的影响。基于测量结果和物理设备仿真,我们通过缩小CMOS器件的RF噪声参数来量化多晶硅栅耗尽的日益增加的危险。虽然多晶硅耗尽不会影响最小噪声系数,但会降低RFIC设计人员的噪声匹配自由度。随着技术规模的缩小,这种趋势恶化了。

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