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A New Operating Scheme by Switching the Polarity of Program/Erase Bias for Partially Oxidized Amorphous-Si-Based Charge-Trap Memory

机译:通过切换部分氧化的基于非晶硅的电荷陷阱存储器的编程/擦除偏压的极性的新操作方案

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In this brief, the authors propose a new program/erase (P/E) scheme for NAND-type partially oxidized amorphous-Si (a-Si)-based charge-trap memory in which the P/E voltages are interchanged into negative/positive ones, respectively. In the a-Si memory, the erasing speed was found to be faster than the programming speed, and therefore, the new scheme has been chosen to keep the program speed faster than the erase speed for the NAND operation. The P/E speeds in the new scheme increase at least ten times as those in the conventional P/E scheme. It is also shown that four-level memory states can be achieved via Fowler-Nordheim tunneling by applying programming voltage of -16, -18, and -20 V for each level during only 40 mus together with erasing voltage pulse (+20 V, 1 ms). These results indicate that the new P/E scheme is more effective than the conventional scheme for operating the partially oxidized a-Si-based memories
机译:在此简介中,作者为基于NAND型部分氧化的非晶硅(a-Si)的电荷陷阱存储器提出了一种新的编程/擦除(P / E)方案,其中P / E电压互换为负/积极的分别。在a-Si存储器中,发现擦除速度快于编程速度,因此,选择了新方案以使编程速度快于NAND操作的擦除速度。新方案中的P / E速度至少是常规P / E方案中的P / E速度的十倍。还显示出可以通过Fowler-Nordheim隧穿来实现四级存储状态,只需在40 mus内为每个电平施加-16,-18和-20 V的编程电压以及擦除电压脉冲(+20 V, 1毫秒)。这些结果表明,新的P / E方案比传统方案对操作部分氧化的基于a-Si的存储器更有效。

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