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Hot-carrier effects in flash erasable programmable read-only memory devices.

机译:闪存可擦可编程只读存储设备中的热载流子效应。

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摘要

Design of the high density Flash Erasable Programmable Read-Only-Memory device (Flash EPROMs) requires a good understanding of the physical mechanisms that govern the device operation. The device is a variation of the Metal-Oxide Semiconductor Field-Effect Transistor (MOSFET) with an extra polysilicon floating-gate electrode. Its operation relies on hot-electron injection and storage of injected electrons in the floating-gate electrode between two dielectrics. The conductive state of the channel is changed by the stored electrons, which provides the memory information.; Electron trapping in the tunnel oxide associated with the hot-electron transfer through the oxide degrades the performance of the memory cell by retarding the carrier transfer and changing the device parameters. In addition, there is also an unintentional hole injection from the substrate. This imposes even more severe constraints on the design of devices with smaller feature sizes.; This thesis covers a variety of topics in Flash EPROMs, including a summary of the various physical mechanisms that govern the device operation as well as those that cause device degradation, a description of the measurement techniques for characterizing the hot-carrier damage in the memory cells, a comparison of several techniques to determine the floating gate potential, an algorithm for the simulation of the device operation, and an extensive study of the hot-carrier induced effects in Flash memory device and circuits.; The hot-carrier induced effects, being the main focus of this thesis, cover various degradation modes as well as data retention problems. The main source of some random failure modes occurring in the operation of a Flash memory chip has been linked to the hot carriers. One of these random failures is in the form of the erratic/nonuniform erase. The mechanisms responsible for this phenomenon have been elaborated in detail, including hole trapping which may also give rise to various other reliability problems. The damage caused by the write and the erase operations has been investigated with the help of a number of measurement techniques. In addition, several write and erase algorithms have been evaluated for minimizing the hot carrier induced effects.
机译:高密度闪存可擦可编程只读存储器(Flash EPROM)的设计需要对控制设备操作的物理机制有很好的了解。该器件是金属氧化物半导体场效应晶体管(MOSFET)的变体,带有一个额外的多晶硅浮栅电极。其操作依赖于热电子注入以及注入的电子在两个电介质之间的浮栅电极中的存储。沟道的导电状态被所存储的电子改变,从而提供了存储信息。与通过氧化物的热电子转移相关联的隧道氧化物中的电子俘获通过延迟载流子转移和改变器件参数而降低了存储单元的性能。另外,还从衬底无意地注入了空穴。这对具有较小特征尺寸的设备的设计施加了甚至更严格的约束。本论文涵盖了闪存EPROM中的各种主题,包括控制设备操作以及导致设备性能下降的各种物理机制的摘要,描述存储单元中热载流子损坏的测量技术的描述。 ,对确定浮栅电位的几种技术进行了比较,一种用于模拟器件操作的算法以及对闪存器件和电路中热载流子感应效应的广泛研究。热载流子引起的效应是本论文的重点,涵盖了各种降级模式以及数据保留问题。闪存芯片操作中出现的某些随机故障模式的主要来源已与热载流子链接。这些随机故障之一是不稳定/不均匀擦除的形式。已经详细说明了造成这种现象的机制,包括陷孔,这也可能引起各种其他可靠性问题。借助于多种测量技术,已经研究了由写入和擦除操作引起的损坏。另外,已经评估了几种写和擦除算法,以最小化热载流子引起的影响。

著录项

  • 作者

    San, Kemal Tamer.;

  • 作者单位

    Yale University.;

  • 授予单位 Yale University.;
  • 学科 Engineering Electronics and Electrical.; Physics Electricity and Magnetism.
  • 学位 Ph.D.
  • 年度 1994
  • 页码 240 p.
  • 总页数 240
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;电磁学、电动力学;
  • 关键词

  • 入库时间 2022-08-17 11:49:45

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