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Comment on “Channel Length and Threshold Voltage Dependence of a Transistor Mismatch in a 32-nm HKMG Technology”

机译:评论“ 32nm HKMG技术中晶体管失配的通道长度和阈值电压依赖性”

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摘要

This correspondence briefly describes and reconciles two separate streams of work, which extend the Pelgrom model for a transistor mismatch. While independently conceived and pursued, similar and complementary conclusions have been reported by these groups, refining the understanding of a transistor mismatch to encompass halo-dominated transistor designs.
机译:该对应关系简要描述并协调了两个独立的工作流程,这扩展了Pelgrom模型的晶体管失配。尽管这些概念是独立构思和追求的,但这些小组已经报告了相似和互补的结论,从而加深了对晶体管失配的理解,以涵盖以晕圈为主导的晶体管设计。

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