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Low-Voltage Transparent Indium–Zinc–Oxide Coplanar Homojunction TFTs Self-Assembled on Inorganic Proton Conductors

机译:自组装在无机质子导体上的低压透明铟-锌-氧化物共面同质结TFT

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$hbox{H}_{3}hbox{PO}_{4}$-incorporated nanocolumnar $hbox{SiO}_{2}$-based proton conductors show an enhanced electric double layer (EDL) capacitance value of $sim!!hbox{8} mu hbox{F/cm}^{2}$ at 20 Hz. The upper frequency limit of EDL formation is found to be higher than 10 kHz. Transparent indium–zinc–oxide (IZO) coplanar homojunction thin-film transistors gated by such proton conductors are fabricated by one metal shadow mask self-assembled method. The operating voltage is found to be as low as 0.6 V. The current on/off ratio, the subthreshold swing, and field-effect mobility are estimated to be $hbox{6} times hbox{10}^{5}$ , 68 mV/dec, and 12 $hbox{cm}^{2}/hbox{V}cdot hbox{s}$ , respectively. Such transparent transistors hold promise for low-cost and portable electrochromic devices and invisible biochemical sensors.
机译:基于$ hbox {H} _ {3} hbox {PO} _ {4} $的纳米柱基于$ hbox {SiO} _ {2} $的质子导体表现出的增强的电双层(EDL)电容值为$ sim! !hbox {8} mu hbox {F / cm} ^ {2} $在20 Hz下。发现EDL形成的频率上限高于10kHz。用一种金属荫罩自组装方法制造由这种质子导体选通的透明铟-锌-氧化物(IZO)共面同质结薄膜晶体管。发现工作电压低至0.6V。电流开/关比,亚阈值摆幅和场效应迁移率估计为$ hbox {6}乘以hbox {10} ^ {5} $,68 mV / dec和12 $ hbox {cm} ^ {2} / hbox {V} cdot hbox {s} $。这种透明晶体管有望用于低成本和便携式电致变色设备以及不可见的生化传感器。

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