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P‐11: Electrical Properties and Stability of Dual‐Gate Coplanar Homojunction Amorphous Indium‐Gallium‐Zinc‐Oxide Thin‐Film Transistor

机译:p-11:双栅共面同质非晶铟镓 - 氧化锌薄膜晶体管的电学特性和稳定性

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摘要

The electrical characteristics and stabilities of dual‐gate (DG) coplanar homojunction amorphous indium‐gallium‐zinc‐oxide thin‐film transistors (a‐IGZO TFTs) are described. When the gate voltage is applied on top and bottom electrodes, the DG a‐IGZO TFT showed an excellent electrical performance with the sub‐threshold swing of 99 mV/dec, the mobility of 15.1 cm 2 /V·s and the on‐off ratio of 10 9 . Under positive bias temperature stress, the device threshold voltage shifts about +4.5V after 10,000 seconds, while its shifts under negative bias temperature stress are very small. The effect of TFT illumination is also discussed.
机译:描述了双栅极(DG)共面同质结非晶铟镓锌氧化锌薄膜晶体管(a-IGZO TFT)的电气特性和稳定性。当在顶部和底部电极上施加栅极电压时,DG a-IGZO TFT显示出出色的电气性能,亚阈值摆幅为99 mV / dec,迁移率为15.1 cm 2 / V·s,并且导通/截止比率10 9。在正偏置温度应力下,器件阈值电压在10,000秒后移动约+ 4.5V,而其在负偏置温度应力下的漂移很小。还讨论了TFT照明的效果。

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