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The Effect of Adjacent Bit-Line Cell Interference on Random Telegraph Noise in nand Flash Memory Cell Strings

机译:位线单元相邻干扰对nand闪存单元串中随机电报噪声的影响

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The effect of adjacent bit-line (BL) cell interference on BL current fluctuation $(Delta I_{rm BL} = hbox{high} I_{rm BL} - hbox{low} I_{rm BL})$ due to random telegraph noise (RTN) in floating-gate nand Flash cell strings is characterized. It was found that the electron current density $(J_{e})$ of a read cell can be appreciably different depending on the position in the channel width direction because of the interference from adjacent BL cells. The interference can be controlled by the state (program or erase) of the adjacent cells. We verified that $Delta I_{rm BL}$ due to RTN increases as a high-$J_{rm e}$ position is controlled to be close to a trap position in 32-nm nand Flash memory strings. Finally, it was also shown that the adjacent cell interference affects not only $Delta I_{rm BL}$ but also the ratio of capture and emission time constants $[ln(tau_{c}/tau_{e})]$.
机译:由于随机电报,相邻位线(BL)单元干扰对BL电流波动$(Delta I_ {rm BL} = hbox {high} I_ {rm BL}-hbox {low} I_ {rm BL})$的影响表征了浮栅nand Flash单元串中的噪声(RTN)。发现由于相邻的BL单元的干扰,读取单元的电子电流密度$(J_ {e})$可以根据沟道宽度方向上的位置而明显不同。可以通过相邻单元的状态(编程或擦除)来控制干扰。我们验证了由于RTN引起的$ Delta I_ {rm BL} $的增加,因为高$ J_ {rm e} $位置被控制为接近32纳米nand Flash存储器串中的陷阱位置。最后,还表明,相邻小区干扰不仅影响$ Delta I_ {rm BL} $,而且还影响捕获和发射时间常数之比$ [ln(tau_ {c} / tau_ {e})] $。

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