A Quasi-Two-Dimensional Threshold Voltage Model for Short-Channel Junctionless Double-Gate MOSFETs

摘要

Based on the bulk conduction mode of the quasi-2-D scaling theory, an analytical threshold voltage model for short-channel junctionless (JL) double-gate MOSFETs is developed for the first time. The model explicitly shows how the device parameters such as the silicon thickness, oxide thickness, drain bias, and channel length affect the threshold voltage degradation. The model can also be extended to modeling accumulation/inversion operation mode for JL/junction-based double-gate MOSFETs. The model is verified by 2-D device simulations and can be easily used to explore the threshold voltage behavior of the JL double-gate MOSFETs due to its simple formula and computational efficiency.