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首页> 外文期刊>IEEE Transactions on Electron Devices >Analog Characteristics of Fully Printed Flexible Organic Transistors Fabricated With Low-Cost Mass-Printing Techniques
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Analog Characteristics of Fully Printed Flexible Organic Transistors Fabricated With Low-Cost Mass-Printing Techniques

机译:低成本批量印刷技术制造的全印刷柔性有机晶体管的模拟特性

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Fully printed organic field effect transistors (OFETs) are fabricated on a flexible, 100- $mu{rm m}$ -thick, polyethylene terephthalate substrate using high-throughput printing techniques: 1) Cyflex; 2) gravure; 3) screen; and 4) flexographic printing without using a cleanroom, and below 130 $^{circ}{rm C}$ . The dependence of the transconductance $({g}_{m})$ , transit-frequency $({f}_{T})$ , and intrinsic-gain on the bias drain current $({I}_{rm D})$ are measured. The OFETs show intrinsic gain for ${I}_{rm D}>10~{rm nA}/{rm mm}$ (per millimeter width), and reach ${f}_{T}=64~{rm kHz}$ at ${I}_{rm D}=16~mu{rm A}/{rm mm}$ , whereas the ${g}_{m}$ loss with frequency is ${<}{10%}$ up to ${f}_{T}$ . Unlike silicon MOSFETs, the dependence of the OFET ${g}_{m}$ on the ${f}_{T}$ in the subthreshold region is found to be weaker than ${I}_{rm D}^{1.0^{vphantom{)}}}$ . In addition, the overlap capacitance of the staggered-geometry OFET shows strong frequency dependence, and this is - hown to be related to the overlap semiconductor. For the first time, it is found that the impact of process variations and bias stress on the OFET analog characteristics can be significantly attenuated by biasing the device at a fixed ${I}_{rm D}$ . This approach is tested on an array of five amplifiers, reaching the gain-bandwidth product of 32 kHz, within ${pm}{3.7%}$ variations.
机译:使用高通量印刷技术,在柔性的,厚度为100μm的聚对苯二甲酸乙二醇酯基板上制造全印刷有机场效应晶体管(OFET):1)Cyflex; 2)凹版印刷; 3)屏幕;和4)不使用洁净室且低于130 $ ^ {circ} {rm C} $的柔版印刷。跨导$({g} _ {m})$,渡越频率$ {{f} _ {T})$和本征增益对偏置漏极电流$({I} _ {rm D })$被测量。 OFETs显示出$ {I} _ {rm D}> 10〜{rm nA} / {rm mm} $(每毫米宽度)的固有增益,并达到$ {f} _ {T} = 64〜{rm kHz } $ at $ {I} _ {rm D} = 16〜mu {rm A} / {rm mm} $,而$ {g} _ {m} $随频率的损失为$ {<} {10%} $至$ {f} _ {T} $美元。与硅MOSFET不同,在阈值以下区域中,OFET $ {g} _ {m} $对$ {f} _ {T} $的依赖性比$ {I} _ {rm D} ^ { 1.0 ^ {vphantom {)}}} $。另外,交错几何结构OFET的重叠电容表现出很强的频率依赖性,并且这与重叠半导体有关。首次发现,通过以固定的$ {I} _ {rm D} $偏置器件,可以显着降低工艺变化和偏置应力对OFET模拟特性的影响。此方法在五个放大器的阵列上进行了测试,达到32 kHz的增益带宽乘积,变化范围为$ {pm} {3.7%} $。

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