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Generation-Recombination Effect in MWIR HgCdTe Barrier Detectors for High-Temperature Operation

机译:高温操作MWIR HgCdTe势垒探测器的生成-复合效应

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An advanced numerical model was applied to investigate dark current–voltage characteristics of high operating temperature (HOT) HgCdTe pBnN and pBpN barrier detectors operated in midwave infrared spectral range. In addition to diffusion mechanisms, all assumed generation–recombination effects, including Shockley–Read–Hall (SRH) mechanism associated with metal site vacancies and dislocations, tunneling, and impact ionization, allow more precise interpretation of obtained experimental results. Investigated structures have the same cap-barrier structural unit (pB) and N bottom contact layer but a different n- and p-type absorption layer optimized at cutoff wavelength up to at 230 K. Both type barrier detectors exhibit very low experimental dark currents, in the range of 2– A/cm at 230 K. Calculations show that currents in the device with the n-type absorber are limited by Auger processes while currents in the device with the p-type absorption layer are mainly associated with SRH mechanisms. A reduction of the thermal generation rate in a wide bandgap barrier is observed. The presence of the enhanced electric field in the depletion regions increases trap-assisted tunneling via traps located at dislocation cores. In high-quality materials, with a reduced number of structural defects, the device with p-type absorption layer should provide lower dark currents in HOTs.
机译:一个高级数值模型被用于研究在中波红外光谱范围内工作的高工作温度(HOT)HgCdTe pBnN和pBpN势垒探测器的暗电流-电压特性。除扩散机制外,所有假定的世代-复合效应,包括与金属位点空位和位错,隧穿和碰撞电离相关的肖克利-雷德-霍尔(SRH)机制,都可以更精确地解释获得的实验结果。被研究的结构具有相同的盖帽-屏障结构单元(pB)和N底部接触层,但在截止波长高达230 K时优化了不同的n型和p型吸收层。这两种类型的屏障检测器均显示出非常低的实验暗电流,在230 K时,该电流在2–A / cm范围内。计算表明,带有n型吸收器的器件中的电流受俄歇过程的限制,而带有p型吸收层的器件中的电流主要与SRH机制有关。观察到宽带隙势垒中的热产生速率降低。耗尽区中增强电场的存在增加了通过位于位错核心处的阱的阱辅助隧穿。在具有减少的结构缺陷数量的高质量材料中,具有p型吸收层的器件应在HOT中提供较低的暗电流。

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