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AlN/SiO2/Si3N4/Si(100)-Based CMOS Compatible Surface Acoustic Wave Filter With −12.8-dB Minimum Insertion Loss

机译:基于AlN / SiO 2 / Si 3 N 4 / Si(100)的CMOS兼容表面声波滤波器,最小插入量为-12.8dB失利

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摘要

A CMOS compatible AlN/SiO/SiN/Si(100) surface acoustic wave (SAW) device has been fabricated and will be compared with standard AlN/SiO-based devices. The presented filter demonstrates high potential for CMOS integrated high-frequency SAW devices. The filter insertion loss could be improved to -12.8 dB. The device exhibits high crosstalk suppression of -50 dB on a standard Si-substrate (10 Ωcm). X-ray diffraction, (scanning) transmission electron microscopy, and energy dispersive X-ray spectroscopy studies correlate the signal quality with c -axis orientation of aluminum nitride films on interdigitated transducer finger electrodes. Finite-element method simulations are in good agreement with the electric measurements and show typical Rayleigh particle displacement.
机译:已经制造了CMOS兼容的AlN / SiO / SiN / Si(100)表面声波(SAW)器件,并将其与基于标准AlN / SiO的器件进行比较。提出的滤波器展示了CMOS集成高频SAW器件的巨大潜力。滤波器的插入损耗可以提高到-12.8 dB。该器件在标准Si衬底(10Ωcm)上表现出-50 dB的高串扰抑制。 X射线衍射,(扫描)透射电子显微镜和能量色散X射线光谱学研究将信号质量与叉指换能器指状电极上氮化铝膜的c轴方向相关联。有限元方法模拟与电学测量非常吻合,并显示出典型的瑞利粒子位移。

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