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Modeling CNTFET Performance Variation Due to Spatial Distribution of Carbon Nanotubes

机译:由于碳纳米管的空间分布而对CNTFET性能变化进行建模

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摘要

In this paper, we studied the impact of spatial distribution of aligned carbon nanotube (CNT) on the performance variation of CNTFETs. The distribution of CNT spacing for a given density is identified and verified through Monte Carlo simulation. This distribution is then incorporated into a compact model to study its impact on the performance variation. It was identified that the spatial distribution of CNT not only generates a new source of performance variation, it also leads to around 10% lower current compared with the generally assumed uniform distribution case at typical CNT density. The approach is also used to evaluate the variations of inverter gate delay and SRAM static read noise margin which demonstrate its capability for predicting CNTFET-based circuit performance variation.
机译:在本文中,我们研究了取向碳纳米管(CNT)的空间分布对CNTFET性能变化的影响。给定密度的CNT间距分布可通过蒙特卡洛模拟进行识别和验证。然后将此分布合并到一个紧凑模型中,以研究其对性能变化的影响。可以确定的是,CNT的空间分布不仅产生了性能变化的新来源,而且与通常假定的典型CNT密度均匀分布情况相比,它还导致电流降低了约10%。该方法还用于评估逆变器栅极延迟和SRAM静态读取噪声容限的变化,这证明了其预测基于CNTFET的电路性能变化的能力。

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