首页> 外文期刊>Electron Devices, IEEE Transactions on >Application Relevant Evaluation of Trapping Effects in AlGaN/GaN HEMTs With Fe-Doped Buffer
【24h】

Application Relevant Evaluation of Trapping Effects in AlGaN/GaN HEMTs With Fe-Doped Buffer

机译:掺铁缓冲剂在AlGaN / GaN HEMT中的俘获效应的应用相关性评估

获取原文
获取原文并翻译 | 示例

摘要

This paper investigates the impact of different iron (Fe) buffer doping profiles on trapping effects in microwave AlGaN/gallium nitride (GaN) high electron mobility transistors (HEMTs). We characterize not only the current collapse due to trapping in the buffer, but also the recovery process, which is important in the analysis of suitable linearization schemes for amplitude modulated signals. It is shown that the simple pulsed dc measurements of current transients can be used to investigate transient effects in the RF power. Specifically, it is revealed that the design of the Fe-doping profile in the buffer greatly influences the recovery time, with the samples with lower Fe concentration showing slower recovery. In contrast, traditional indicators, such as S-parameters and dc as well as pulsed – characteristics, show very small differences. An analysis of the recovery shows that this effect is due to the presence of two different detrapping processes with the same activation energy (0.6 eV) but different time constants. For highly doped buffers, the faster process dominates, whereas the slower process is enhanced for less doped buffers.
机译:本文研究了不同的铁(Fe)缓冲剂掺杂轮廓对微波AlGaN /氮化镓(GaN)高电子迁移率晶体管(HEMT)中的俘获效应的影响。我们不仅描述了由于陷于缓冲器而引起的电流崩溃,而且还描​​述了恢复过程,这对于分析调幅信号的合适线性化方案非常重要。结果表明,电流瞬变的简单脉冲直流测量可用于研究射频功率中的瞬态影响。具体地,揭示了在缓冲液中的Fe掺杂分布的设计极大地影响了恢复时间,具有较低Fe浓度的样品显示出较慢的恢复。相反,传统的指标(例如S参数和dc以及脉冲特性)显示出很小的差异。对回收率的分析表明,这种影响是由于存在两个具有相同活化能(0.6 eV)但时间常数不同的不同捕获过程。对于高掺杂的缓冲区,较快的过程占优势,而对于掺杂较少的缓冲区,则增强了较慢的过程。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号