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首页> 外文期刊>Electron Devices, IEEE Transactions on >Step JTE, an Edge Termination for UHV SiC Power Devices With Increased Tolerances to JTE Dose and Surface Charges
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Step JTE, an Edge Termination for UHV SiC Power Devices With Increased Tolerances to JTE Dose and Surface Charges

机译:Step JTE,用于特高压SiC功率器件的边缘终端,对JTE剂量和表面电荷的容忍度提高

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摘要

An edge termination method, referred to as guard-ring-assisted multistep junction termination extension (MS-GR-JTE), is presented for ultrahigh voltage silicon carbide (SiC) power devices. In comparisonwith other JTEs, the MS-GR-JTE creates a step electric field (EF) distribution with greatly reduced peak EF at the corners and edges of the device, resulting in a superior breakdown voltage (BV) performance with wide tolerances to JTE dose and SiC surface charges. According to the numerical simulations based on a 100- μm -thick epilayer, an optimized MS-GR-JTE shows that the 15-kV BV performance with wide tolerances of 1.3×1012 cm −2 to JTE dose and 6.1×1012 cm −2 to positive surface charges are obtained, respectively, both superior to other compared JTEs.
机译:提出了一种用于超高压碳化硅(SiC)功率器件的边缘终止方法,称为保护环辅助多步结终止扩展(MS-GR-JTE)。与其他JTE相比,MS-GR-JTE产生了阶跃电场(EF)分布,在器件的拐角和边缘处的峰值EF大大降低,从而产生了出色的击穿电压(BV)性能,对JTE剂量具有宽容度和SiC表面电荷。根据基于100μm厚外延层的数值模拟,优化的MS-GR-JTE显示15kV BV性能,对JTE剂量的宽容限为1.3×1012 cm -2,对6.1×1012 cm -2的宽容限分别获得了比其他JTE更优异的表面正电荷。

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