首页> 外文期刊>Electron Devices, IEEE Transactions on >Design and Characterization of Sloped-Field-Plate Enhanced Trench Edge Termination
【24h】

Design and Characterization of Sloped-Field-Plate Enhanced Trench Edge Termination

机译:斜场板增强沟槽边缘端接的设计与表征

获取原文
获取原文并翻译 | 示例

摘要

In this paper, the design and characterization of the sloped-field-plate enhanced trench edge termination structure are carried out. For achieving the ideal planar junction breakdown voltage and high dV/dt performance, structural parameters, including the depth of the sloped-field-plate and the depth and width of the trench, need to be well designed. Using extensive numerical simulations, the above-mentioned design is accomplished. Experimental results show that for 600 V class devices, a breakdown voltage of 757 V can be achieved by the devices with a trench width larger than 20 μm . The breakdown characteristics are verified as the ideal planar junction breakdown by using liquid crystal thermal measurement. Furthermore, the high dV/dt measurement results show that the devices with a trench width larger than 25 μm are capable of handling a high dV/dt of 28.9 kV/ μs even at a bus voltage of 750 V.
机译:本文进行了斜场板增强沟槽边缘终端结构的设计与表征。为了获得理想的平面结击穿电压和高dV / dt性能,需要精心设计结构参数,包括倾斜场板的深度以及沟槽的深度和宽度。使用大量的数值模拟,可以完成上述设计。实验结果表明,对于600 V级的器件,沟槽宽度大于20μm的器件可以实现757 V的击穿电压。通过使用液晶热测量将击穿特性验证为理想的平面结击穿。此外,高dV / dt测量结果表明,沟槽宽度大于25μm的器件即使在总线电压为750 V的情况下也能够处理28.9 kV /μs的高dV / dt。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号