机译:斜场板增强沟槽边缘端接的设计与表征
Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong;
Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong;
Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong;
Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong;
Fuji Electric Company Ltd., Matsumoto, Japan;
Fuji Electric Company Ltd., Matsumoto, Japan;
Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong;
Electric breakdown; Silicon; Junctions; Dielectrics; Current density; Structural engineering; Impact ionization;
机译:用于1200V级SiC器件的深沟道U形场板边缘端接的设计和表征
机译:非均匀100V超结沟槽功率MOSFET的边缘端接设计
机译:4H-SiC器件的高效率沟槽端接的设计与表征
机译:通用沟槽边缘终端设计
机译:浅沟槽隔离蚀刻线边缘粗糙度的表征。
机译:通过现实网络的基于OWA运算符的集合设计增强边缘攻击策略
机译:通用沟槽边缘终端设计
机译:轻量级增强型沟槽架空保护系统(LETOps):原型性能的表征。