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Single-Event Gate Rupture Hardened Structure for High-Voltage Super-Junction Power MOSFETs

机译:用于高压超接线功率MOSFET的单事件栅极破裂硬化结构

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摘要

This article presents design for a 650-V super-junction (SJ) power metal-oxide-semiconductor field effect transistor (MOSFET) which improves tolerance to both single-event burnout (SEB) and single-event gate rupture (SEGR). Experimental measurements of SEGR in a generic commercial planar gate SJ device are used to validate the accuracy of the design. In an SJ device with a planar gate, reducing the neck width improves the tolerance to gate rupture but significantly changes the electrical device characteristics. The trench gate SJ device design is shown to overcome this problem. A buffer layer and larger P+-plug are added to the trench gate SJ power transistor to improve SEB tolerance. The proposed trench gate structure improves the SEGR survivability by a factor of 10.
机译:本文介绍了650 V超接插(SJ)功率金属 - 氧化物 - 氧化物 - 半导体场效应晶体管(MOSFET)的设计,这提高了对单事件烧坏(SEB)和单事件栅极破裂(SEGR)的公差。 通用商业平面栅极SJ器件中SEGR的实验测量用于验证设计的准确性。 在具有平面栅极的SJ器件中,减小颈部宽度改善了栅极破裂的公差,而是显着改变电气设备特性。 显示沟槽门SJ器件设计克服了这个问题。 缓冲层和较大的p + -plug被添加到沟槽栅极Sj功率晶体管中以改善SEB公差。 所提出的沟槽栅极结构将SEGR生存性提高了10倍。

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