首页> 外文期刊>IEEE Electron Device Letters >InAlAs/InGaAs channel composition modulated transistors with InAs channel and AlAs/InAs superlattice barrier layer
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InAlAs/InGaAs channel composition modulated transistors with InAs channel and AlAs/InAs superlattice barrier layer

机译:具有InAs沟道和AlAs / InAs超晶格势垒层的InAlAs / InGaAs沟道成分调制晶体管

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We have successfully fabricated a new type of InAlAs/InGaAs heterojunction FET (HJFET) with modulated indium composition channels, called channel composition modulated transistors (CCMTs) in which an InAs channel is sandwiched by In/sub 0.53/Ga/sub 0.47/As/In/sub 0.8/Ga/sub 0.2/As sub-channels. The fabricated devices also employ an AlAs/InAs superlattice as a barrier layer against impurity contamination to provide high thermal stability. A 0.2-/spl mu/m T-shaped gate device exhibits a g/sub m/ of 1370 mS/mm, F/sub t/ of 180 GHz and F/sub max/ of 210 GHz at a low drain bias of 1.0 V. In high-temperature DC life tests conducted at more than 230/spl deg/C, the devices exhibited less than a 3% degradation in I/sub dss/ and g/sub m/ after 1000 h. This demonstrates that these newly-developed CCMTs incorporating AlAs/InAs superlattice insertion technology can offer high-performance and highly-reliable InP-based HJFET's for various microwave and millimeter-wave applications.
机译:我们已经成功制造了一种新型InAlAs / InGaAs异质结FET(HJFET),具有调制的铟成分沟道,称为沟道成分调制晶体管(CCMT),其中InAs沟道夹在In / sub 0.53 / Ga / sub 0.47 / As /中In / sub 0.8 / Ga / sub 0.2 / As子通道。所制造的器件还采用AlAs / InAs超晶格作为阻挡杂质的阻挡层,以提供高的热稳定性。 0.2- / splμm/ m的T形栅极器件在1.0V的低漏极偏置下表现出1370 mS / mm的g / sub m /,180 GHz的F / sub t /和210 GHz的F / sub max /在高于230 / spl deg / C的高温DC寿命测试中,在1000小时后,这些器件的I / sub dss /和g / sub m /降低了不到3%。这表明这些新开发的结合了AlAs / InAs超晶格插入技术的CCMT可以为各种微波和毫米波应用提供高性能和高度可靠的基于InP的HJFET。

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