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Experimental Measurements of Majority and Minority Carrier Lifetime Profile in SI Epilayers by the Use of an Improved OCVD Method

机译:通过改进的OCVD方法对SI外延层中多数和少数载流子寿命进行实验测量

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摘要

In this letter, the first experimental results of a recently proposed technique for measuring the carrier lifetime profile are presented. The technique makes use of a four-terminal bipolar test structure to electrically define the epilayer volume where recombination occurs and employs the open circuit voltage decay method for lifetime parameters extraction. For the capability of the test structure to depurate measurements from the parasitic ohmic effects, the technique is able to measure the ambipolar and minority carrier lifetime along epilayer at high and low injection levels respectively. Comparisons of measurements with numerical simulations are reported to confirm the validity of the proposed technique.
机译:在这封信中,介绍了最近提出的用于测量载流子寿命曲线的技术的第一个实验结果。该技术利用四端双极测试结构来电定义发生重组的外延层体积,并采用开路电压衰减方法提取寿命参数。为了使测试结构能够从寄生欧姆效应中纯化出测量结果,该技术能够分别在高和低注入水平下沿epilayer测量双极性和少数载流子的寿命。报告了与数值模拟的测量结果的比较,以确认所提出技术的有效性。

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