首页> 外文期刊>Electron Device Letters, IEEE >Analytical Cell-Based Model for the Breakdown Statistics of Multilayer Insulator Stacks
【24h】

Analytical Cell-Based Model for the Breakdown Statistics of Multilayer Insulator Stacks

机译:基于单元格的多层绝缘子击穿统计分析模型

获取原文
获取原文并翻译 | 示例

摘要

A fully analytical cell-based model is proposed to describe the breakdown (BD) statistics of multiple-layer insulator stacks. The model is shown to be completely equivalent to the full percolation model by comparing with recently published kinetic Monte Carlo simulations. The role of an initial density of native defects in the as-grown oxide and the time-dependent generation of inert defects are successfully addressed. The effect of the generation of interface states on the stack BD statistics is also incorporated into the model.
机译:提出了一种基于单元格的完全分析模型来描述多层绝缘子堆叠的击穿(BD)统计数据。通过与最新发布的动力学蒙特卡洛模拟进行比较,该模型与完全渗透模型完全等效。成功地解决了所生长的氧化物中原始缺陷的初始密度的作用以及惰性缺陷随时间的生成问题。接口状态的生成对堆栈BD统计信息的影响也已纳入模型。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号