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首页> 外文期刊>Electron Device Letters, IEEE >An Analytical Model for the Transfer Characteristics of a Polycrystalline Silicon Thin-Film Transistor With a Double Exponential Grain-Boundary Trap-State Energy Dispersion
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An Analytical Model for the Transfer Characteristics of a Polycrystalline Silicon Thin-Film Transistor With a Double Exponential Grain-Boundary Trap-State Energy Dispersion

机译:具有双指数晶界陷阱态能量色散的多晶硅薄膜晶体管的传输特性分析模型

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摘要

For a thin-film transistor (TFT) built on excimer-laser crystallized polycrystalline silicon, the dependence of the effective “grain-boundary mobility” on the gate-to-source voltage can be divided into two subregimes exhibiting different power-law characteristics. An expression for the effective mobility is developed using a procedure previously proposed for a TFT built on polycrystalline silicon exhibiting only single power-law dependence. The additional power-law component is reflected in the model by a pair of measurable and physically meaningful parameters. The procedure for determining these parameters is described and demonstrated. Both the measured and calculated transfer characteristics are reported and compared. The double power-law dependence implies a grain-boundary trap-state energy dispersion characterized by two exponential functions. This is presently verified.
机译:对于基于准分子激光晶化的多晶硅的薄膜晶体管(TFT),有效的“晶界迁移率”对栅极-源极电压的依赖性可以分为表现出不同的幂律特性的两个子区域。有效迁移率的表达式是使用先前针对仅基于单一幂律相关性的基于多晶硅的TFT提出的程序开发的。附加的幂律分量在模型中通过一对可测量且在物理上有意义的参数反映出来。描述和演示了确定这些参数的过程。测量和计算的传输特性都将报告并进行比较。双幂律相关性意味着以两个指数函数为特征的晶界陷阱态能量色散。目前已验证。

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