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An analytical model of the influence of grain size on the mobility and transfer characteristics of polysilicon thin-film transistors (TFTs)

机译:晶粒尺寸对多晶硅薄膜晶体管(TFT)迁移率和传输特性影响的分析模型

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摘要

Influence of the grain size oil the effective carrier mobility (mu(eff)) and transfer characteristics of a polycrystalline silicon thin-film transistor (poly-Si TFT) has been theoretically investigated by developing analytical model. The dependence of mu(eff) is studied as function of doping concentration and gate voltage for different values of-rain size. It is observed that at low as well as at high doping concentrations, the effective carrier mobility (mu(eff)) increases with increasing grain size, whereas the observed dip at the intermediate doping concentration is confirmed. The effect of the grain size on transfer characteristics of poly-Si TFT in its linear region is also presented. It is found that at low gate voltages. mu(eff) and I-D increase rapidly with the increase in V-G for all grain sizes due to the grain boundary barrier lowering effect. At high gate voltage the grain boundary barrier lowering effect becomes insignificant and causes the saturation of mu(eff) and I-D. The model was found to account correctly for the experimentally observed mobility variation and yield a reasonably good agreement.
机译:通过开发分析模型,从理论上研究了晶粒尺寸油的影响,研究了多晶硅薄膜晶体管(poly-Si TFT)的有效载流子迁移率(mu(eff))和传输特性。对mu(eff)的依赖性进行了研究,以了解不同大小的雨水尺寸时掺杂浓度和栅极电压的函数。可以看出,在低掺杂浓度和高掺杂浓度下,有效载流子迁移率(mu(eff))随晶粒尺寸的增加而增加,而在中等掺杂浓度下观察到的倾角得到了确认。还介绍了晶粒尺寸对多晶硅TFT线性区域传输特性的影响。发现在低栅极电压下。由于晶界势垒降低效应,所有晶粒尺寸的mu(eff)和I-D随V-G的增加而迅速增加。在高栅极电压下,晶界势垒的降低效果不明显,并导致mu(eff)和I-D饱和。发现该模型正确地说明了实验观察到的迁移率变化并产生了相当好的一致性。

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