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Density-of-States Modeling of Solution-Processed InGaZnO Thin-Film Transistors

机译:固溶处理的InGaZnO薄膜晶体管的状态密度建模

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摘要

The effects of Ga composition on the performance of InGaZnO (IGZO) thin-film transistors (TFTs) prepared by a sol-gel method are investigated, and the density of states (DOS) is characterized by the device modeling. The TFT mode is changed from a depletion type to an enhancement type, and the extracted DOS parameters are reduced with the increase of Ga contents. The extracted DOS distribution has a higher peak value than that of an IGZO TFT prepared by physical vapor deposition.
机译:研究了Ga组成对通过溶胶-凝胶法制备的InGaZnO(IGZO)薄膜晶体管(TFT)性能的影响,并通过器件建模表征了态密度(DOS)。 TFT模式从耗尽型变为增强型,并且提取的DOS参数随着Ga含量的增加而减少。与通过物理气相沉积制备的IGZO TFT相比,提取的DOS分布具有更高的峰值。

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