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An Integrated LVDS Transmitter in 0.18-$mu$ m CMOS Technology With High Immunity to EMI

机译:具有0.18- $ mu $ m CMOS技术的集成LVDS发送器,具有高抗EMI能力

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This paper presents an on-chip design topology that compensates the effects of electromagnetic interference (EMI) in a low-voltage differential signaling (LVDS) transmitter. The proposed structure enables the transmitter to maintain a wide differential opening by achieving a superior common-mode level independent driving current and common-mode feedback closed-loop gain. Direct power injection measurements illustrate that the proposed LVDS transmitter structure demonstrates a superior EMI immunity as it maintains an eye opening of at least 100 mVp-p in presence of a conductive EMI injection ranging from 150 to 2 GHz with an amplitude of up to 9 Vp-p. Additionally, transverse electromagnetic cell measurements validate the radiated immunity of the proposed integrated LVDS transmitter in presence of an EMI injection of 30 dBm (150 kHz-2 GHz). This EMI robust LVDS transmitter was designed using the UMC 0.18-μm CMOS process.
机译:本文提出了一种片上设计拓扑,该拓扑可补偿低压差分信号(LVDS)发射器中的电磁干扰(EMI)的影响。所提出的结构通过实现优异的独立于共模电平的驱动电流和共模反馈闭环增益,可使发射机保持宽的差分开度。直接功率注入测量表明,所建议的LVDS发射器结构具有出色的EMI抗扰性,因为在存在150至2 GHz幅度高达9 Vp的导电EMI注入的情况下,它可保持至少100 mVp-p的眼图张开度-p。此外,在电磁干扰注入为30 dBm(150 kHz-2 GHz)的情况下,横向电磁单元测量可以验证所建议的集成LVDS发射机的辐射抗扰度。该EMI鲁棒LVDS发射器采用UMC0.18-μmCMOS工艺设计。

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