Comparison Between Different Ways in Making Silicon Dioxide Layer on Silicon Wafers

Chenguang Sun; Qiang Xu; Xuenan Zhang; Yanjun Wang; Zhenfu Liu

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Comparison Between Different Ways in Making Silicon Dioxide Layer on Silicon Wafers

机译：在硅晶片上制造二氧化硅层的不同方法之间的比较

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《MATEC Web of Conferences》 |2016年第2016期|共页
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Chenguang Sun; Qiang Xu; Xuenan Zhang; Yanjun Wang; Zhenfu Liu;
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1. Comparison Between Different Ways in Making Silicon Dioxide Layer on Silicon Wafers [J] . Chenguang Sun1a, Yanjun Wang2, Qiang Xu2, MATEC Web of Conferences . 2017,第1期

机译：在硅晶片上制造二氧化硅层的不同方法之间的比较
2. Ultra-thin silicon oxide layers on crystalline silicon wafers: Comparison of advanced oxidation techniques with respect to chemically abrupt SiO2/Si interfaces with low defect densities [J] . Stegemann Bert, Gad Karim M., Balamou Patrice, Applied Surface Science . 2017,第Feba15期

机译：晶体硅晶片上的超薄氧化硅层：具有低缺陷密度的化学突变SiO2 / Si界面方面先进氧化技术的比较
3. Separately contacted monocrystalline silicon double-layer structure with an amorphous silicon dioxide barrier made by wafer bonding [J] . K Takashina, M Nagase, K Nishiguchi, Semiconductor science and technology . 2010,第12期

机译：通过晶片键合与非晶硅隔离层分开接触的单晶硅双层结构
4. Minority carrier lifetime of silicon wafer passivated by PECVD amorphous silicon layers for silicon heterojunction solar cells [C] . Min Gu Kang, Sung Ju Tark, Joon Sung Lee, Photovoltaic Specialists Conference, 2008. PVSC '08 . 2008

机译：PECVD非晶硅层钝化硅异质结太阳能电池的硅晶片的少数载流子寿命
5. A study of the effect of stoichiometry and hydrogen content on the physical and electrical properties of silicon nitride and oxynitride layers on silicon and silicon dioxide [D] . Robitaille, Louis R. L. 1990

机译：化学计量和氢含量对硅和二氧化硅上氮化硅和氧氮化物层的物理和电学性质的影响的研究
6. Raman Spectra of High-κ Dielectric Layers Investigated with Micro-Raman Spectroscopy Comparison with Silicon Dioxide [O] . P. Borowicz, A. Taube, W. Rzodkiewicz, 2013

机译：用显微拉曼光谱法与二氧化硅比较研究高κ介电层的拉曼光谱
7. Separately contacted monocrystalline silicon double-layer structure with an amorphous silicon dioxide barrier made by wafer bonding [O] . Takashina Kei, Nagase M, Nishiguchi K, 2010

机译：通过晶片键合与非晶硅隔离层分开接触的单晶硅双层结构

Comparison Between Different Ways in Making Silicon Dioxide Layer on Silicon Wafers

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