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Effects of quenching reactions on the breakdown voltage in Ar-Hg penning mixture

机译:猝灭反应对氩汞混合料击穿电压的影响

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References(17) Cited-By(1) The influence of impurity gases on the breakdown voltage of the Penning mixture is investigated. To eliminate the electrode effects from the breakdown phenomena, high frequency (RF) breakdown field in Ar-Hg mixture with small amounts of impurity gases, such as H2, N2, Kr or Xe, is measured at room temperature, using a silica discharge tube. The breakdown field goes up with increasing quantities of admixed impurity gases; the order of effectiveness is XeH2N2Kr. Discussions are made on the infuence of impurity gases on the breakdown. It has become clear that, if quantities of impurity gases are expressed by the products of their partial pressures and the quenching rate constants of metastable Ar by them, the curves of the breakdown field versus impurity quantities are independent of the kind of impurity. From this result, it is concluded that, in Ar-Hg Penning mixture, the dominant cause for the increase in the breakdown voltage is the quenching of metastable Ar by those impurities. The effect of electronegative impurity HI was also measured. However, HI influence was not large.
机译:参考文献(17)Cited-By(1)研究了杂质气体对Penning混合物击穿电压的影响。为了消除击穿现象对电极的影响,使用二氧化硅放电管在室温下测量了含有少量杂质气体(例如H2,N2,Kr或Xe)的Ar-Hg混合物中的高频(RF)击穿场。击穿场随着杂质气体混合量的增加而增加。有效性的顺序为Xe> H2> N2> Kr。讨论了杂质气体对击穿的影响。已经清楚的是,如果用杂质气体的分压和亚稳态Ar的猝灭速率常数的乘积来表示杂质气体的量,则击穿场对杂质量的曲线与杂质的种类无关。从该结果可以得出结论,在Ar-Hg Penning混合物中,击穿电压增加的主要原因是这些杂质对亚稳Ar的猝灭。还测量了负电性杂质HI的影响。但是,HI的影响并不大。

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