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Effect of annealing temperature and doping with Cu on physical properties of cadmium oxide thin films

机译:退火温度和铜掺杂对氧化镉薄膜物理性能的影响

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In this research, pure and copper doped cadmium oxide thin films were prepared by Successive Ionic Layer Adsorption and reaction (SILAR) method using cadmium acetate as the Cd source (cation) and hydrogen peroxide (anion). Optical transmittance is measured by UV–visible spectrophotometer, it is revealed that the copper doping and annealing at 300°C improves the transmittance of these films. The optical band gap of CdO increased to (2.8eV) with Cu doping, but it is decreased to (2.4eV) with annealing. The results show that the pure and doped CdO thin films at annealing temperature of 300°C have grain size in the range of 19.1nm and 44.4nm, respectively.
机译:在这项研究中,采用乙酸镉作为镉源(阳离子)和过氧化氢(阴离子),通过连续离子层吸附和反应(SILAR)方法制备了纯铜掺杂的氧化镉薄膜。用紫外可见分光光度计测量透光率,发现铜掺杂和300°C退火可提高这些薄膜的透光率。 CdO的光带隙在Cu掺杂下增加到(2.8eV),但在退火后减小到(2.4eV)。结果表明,在退火温度为300°C时,纯CdO和掺杂CdO薄膜的晶粒尺寸分别在19.1nm和44.4nm范围内。

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