退火温度对二氧化钛薄膜的性能影响

摘要

为了获得性能优良的二氧化钛薄膜,采用电子束蒸发沉积方法制备二氧化钛薄膜,并分别在300、600、900℃空气中对样品进行退火处理以改善所制备二氧化钛薄膜的性能.分别采用X射线衍射(XRD)、原子力显微镜(AFM)以及分光光度计研究了退火温度对二氧化钛薄膜结构和光学性能的影响.结果表明,退火处理可以使二氧化钛薄膜由非晶态薄膜转换为金红石型薄膜,且金红石晶型成分随退火温度的加大而增大,同时退火处理可以改善二氧化钛薄膜在300～1 200 nm光谱范围的总吸光率以及增大二氧化钛薄膜的应用范围.%In order to obtain good performance of titanium dioxide thin film,this experiment used electron beam evaporation deposition method to fabricate titanium films.Then the films were annealed at 300 degrees,600 degrees,and 900 degrees to improve the performance of the preparation of titanium dioxide thin film.X-ray diffraction (XRD),atomic force microscope (AFM) and spectrophotometer were used respectively to study the influence of structure and optical properties of titanium oxide film.The results show that the model of the film at room temperature was amorphous but the films after annealing transformed to rutile which is proportional to the annealing temperature.Annealing could also improve the total light absorption of the titanium dioxide thin film in the 300～1 200 nm spectral range.Annealing treatment could broaden the application of titanium dioxide thin film.