首页> 外国专利> METHOD FOR COATING A TITANIA THIN FILM ON THE SURFACE OF METAL, CAPABLE OF OBTAINING EXCELLENT MECHANICAL STRENGTH AND PHOTODEGRADABLE PROPERTY OF THE TITANIA THIN FILM

METHOD FOR COATING A TITANIA THIN FILM ON THE SURFACE OF METAL, CAPABLE OF OBTAINING EXCELLENT MECHANICAL STRENGTH AND PHOTODEGRADABLE PROPERTY OF THE TITANIA THIN FILM

机译:在金属表面上涂覆二氧化钛薄膜的方法,能够获得优异的机械强度和光降解性能的二氧化钛薄膜

摘要

PURPOSE: A method for coating a titania thin film on the surface of a metal is provided to rapidly coat the titania thin film on the surface of the metal while preventing faults such as crack and a pin hole from being generated on the surface of the metal.;CONSTITUTION: A method for coating a titania thin film on the surface of a metal comprises the following steps: washing a metal surface; and forming the titania thin film on the metal surface through a plasma-enhanced atomic layer deposition. The titania thin film has TDMAT(Trakisdimethylamidotitanium) as a precursor. The titania thin film is deposited using oxygen of plasma state as a reactive group. The deposition method comprises: a step injecting the TDMAT on a heated metal surface; a purging step for eliminating remaining precursor; injecting oxygen of plasma state to react with the TDMAT; and the purging step for removing remaining gas and by-products.;COPYRIGHT KIPO 2010
机译:目的:提供一种在金属表面上涂覆二氧化钛薄膜的方法,以在金属表面上快速涂覆二氧化钛薄膜,同时防止在金属表面上产生诸如裂纹和针孔之类的缺陷。组成:一种在金属表面上涂覆二氧化钛薄膜的方法,包括以下步骤:清洗金属表面;通过等离子体增强原子层沉积在金属表面形成二氧化钛薄膜。二氧化钛薄膜具有TDMAT(Trakisdimethylamidotitanium)作为前体。使用等离子体状态的氧作为反应性基团来沉积二氧化钛薄膜。沉积方法包括:将TDMAT注入加热的金属表面上的步骤;清除残留前驱物的吹扫步骤;注入血浆氧与TDMAT反应;以及清除残留气体和副产物的吹扫步骤。; COPYRIGHT KIPO 2010

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